C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 317/22 (2006.01) B41M 5/26 (2006.01) B41M 5/333 (2006.01) C07C 317/32 (2006.01)
Patent
CA 2046687
Abstract of the Disclosure 4-Hydroxydiphenylsulfone derivatives represented by formula (I) Image (I) wherein R1, R2, R3 and R4, independently from one another, each denote a hydrogen atom, an alkyl group, a substituted or unsubstituted phenyl group or a cycloalkyl group, provided at least one of R1, R2, R3 and R4 is other than a hydrogen atom, and R denotes an alkyl group, an alkenyl group, a substituted or unsubstituted phenyl group, a substituted or unsubstituted cycloalkyl group or a substituted or unsubstituted phenylalkyl group. Said compounds are useful as a developer in a heat sensitive color formation layer of a heat sensitive recording material.
Kinishi Ryoichi
Minami Toshiaki
Ohashi Reiji
Shimada Akira
Umeda Hiroaki
Jujo Paper Co. Ltd.
Kinishi Ryoichi
Minami Toshiaki
Ohashi Reiji
Shimada Akira
LandOfFree
Phenolic compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phenolic compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phenolic compounds will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2082376