C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/254, 167/262
C07C 317/46 (2006.01) A61K 31/10 (2006.01) A61K 31/19 (2006.01) A61K 31/215 (2006.01) C07C 59/215 (2006.01) C07C 69/708 (2006.01) C07C 315/02 (2006.01) C07C 317/14 (2006.01) C07C 317/22 (2006.01) C07C 317/24 (2006.01) C07C 321/00 (2006.01) C07C 323/09 (2006.01) C07C 323/20 (2006.01) C07C 323/62 (2006.01)
Patent
CA 1331763
ABSTRACT OF THE DISCLOSURE : Phenoxyalkylcarboxylic acid derivatives of the following formula, Image wherein R1 indicates hydrogen atom, methyl group or ethyl group, m is an integer from 2 to 5, and n is an integer from 3 to 8, X 1 and X2 each independently represent sulfur atom, oxygen atom, sulfinyl group or sulfonyl group, proviso X1 and X2 are not simultaneously oxygen atom; their alkali salts and hydrates thereof are useful as antiallergic agents.
592555
Awano Katsuya
Kimura Tetsuya
Ohashi Mitsuo
Tanaka Toshio
Borden Ladner Gervais Llp
Kyorin Pharmaceutical Co. Ltd.
LandOfFree
Phenoxyalkylcarboxylic acid derivatives and process for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phenoxyalkylcarboxylic acid derivatives and process for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phenoxyalkylcarboxylic acid derivatives and process for... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1299014