C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/254, 167/260
C07C 59/84 (2006.01) A61K 31/215 (2006.01) C07C 59/90 (2006.01) C07C 69/738 (2006.01)
Patent
CA 1327601
Abstract of the invention : Phenoxyalkylcarboxylic acid derivatives of the following formula, Image wherein R1 indicates a hydrogen atom, a methyl group or an ethyl group, m is equal to 2, 3 or 4, and n is equal to 3 or 4, their alkali salts and hydrates thereof are useful as antiallergic agents.
577020
Awano Katsuya
Kimura Tetsuya
Ohashi Mitsuo
Tanaka Toshio
Borden Ladner Gervais Llp
Kyorin-Pharmaceutical Co. Ltd.
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