C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/547.1, 71/9.
C07C 275/64 (2006.01) A01N 47/30 (2006.01) C07C 275/36 (2006.01)
Patent
CA 1194035
Abstract of the Disclosure: Phenoxyphenylureas of the formula Image where R is hydrogen, methyl or methoxy, X is hydrogen , halogen or trifluoromethyl and Y is C1-C3-haloalkoxy, are used for controlling undesirable plant growth.
419051
Becker Rainer
Varwig Juergen
Wuerzer Bruno
Basf Aktiengesellschaft
Robic Robic & Associes/associates
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