C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/295, 260/297
C07D 307/84 (2006.01) C07C 279/26 (2006.01) C07D 209/42 (2006.01) C07D 213/82 (2006.01) C07D 215/48 (2006.01) C07D 307/79 (2006.01) C07D 311/22 (2006.01) C07D 333/38 (2006.01)
Patent
CA 1076126
ABSTRACT OF THE DISCLOSURE Phenylacetic acid derivatives with which the present invention is concerned are compounds of the general formula (I) Image (I), wherein A is an aryl radical which is unsubstituted or sub- stituted by one or more halogen, trifluoromethyl, alkyl, alkoxy, alkenyloxy, alkoxyalkoxy, alkyl-substituted amino or aryloxy, or a heterocyclic ring system which is unsubstituted or sub- stituted by halogen, alkyl or alkoxy, Y is a valency bond or an unbranched or branched alkylene radical containing 1 to 3 carbon atoms and R1 and R2, which may be the same or different, are hydrogen atoms or lower alkyl radicals; and the physiologically compatible salts and esters thereof. The compounds and the physiologically compatible salts and esters thereof possess surprisingly outstanding hypoglycaemic and/or hypolipidaemic properties.
257234
Heerdt Ruth
Hitzel Volker
Hubner Manfred
Kuhnle Hans
Weyer Rudi
Boehringer Mannheim G.m.b.h.
Na
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