C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 217/08 (2006.01) A61K 31/135 (2006.01) A61K 31/36 (2006.01) C07C 211/27 (2006.01) C07C 211/34 (2006.01) C07C 217/12 (2006.01) C07C 217/52 (2006.01) C07C 217/56 (2006.01) C07C 217/60 (2006.01) C07C 217/62 (2006.01) C07C 323/25 (2006.01) C07C 323/29 (2006.01) C07D 317/58 (2006.01)
Patent
CA 2057959
Abstract of the Disclosure Pharmacologically active compounds corresponding to the general formula I: Image wherein m represents 1-4, n represents 2-5, R1 is hydrogen or lower alkyl, R2 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl, and R3 is hydrogen, lower alkyl, lower alkoxy or halogen, or R2 and R3 are linked to adjacent carbon atoms and together form an alkylenedioxy group with 1-2 carbon atoms, R4 represents a saturated monocyclic or bicyclic hydrocarbon radical derived from terpenes and having 10 or 11 hydrocarbon atoms, and Z represents oxygen, an N-R5 group, wherein R5 is lower alkyl, or if R4 is a dihydronopyl radical, Z may also be sulfur, and their acid addition salts.
Ban Ivan
Christen Marie-Odile
David Samuel
Hell Insa
Kraehling Hermann
Kali-Chemin Pharma Gmbh
Swabey Ogilvy Renault
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