C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/179, 260/297
C07C 59/56 (2006.01) A61K 31/00 (2006.01) C07C 43/225 (2006.01) C07C 45/44 (2006.01) C07C 47/24 (2006.01) C07C 59/64 (2006.01) C07C 69/732 (2006.01) C07C 255/35 (2006.01) C07C 255/37 (2006.01) C07D 207/27 (2006.01) C07D 213/48 (2006.01) C07D 213/54 (2006.01) C07D 213/55 (2006.01) C07D 307/46 (2006.01) C07D 307/54 (2006.01) C07D 309/30 (2006.01) C07D 333/22 (2006.01) C07D 333/24 (2006.01) C07D 405/06 (2006.01) C07D 407/06 (2006.01) C07D 409/06 (2006.01)
Patent
CA 2031174
- 1 - Abstract The present invention is directed to a novel phenylethylene derivative of the formula: Image wherein R1 is a phenyl group, a fluorophenyl group, a methoxyphenyl group, thienyl group, furyl group, oxopyrrolidinyl group or pyridyl group, or a pharmaceutically acceptable ester, amide, lactone or salt. The derivatives of the present invention have very good HMG-CoA reductase inhibitory activity and are useful as anti-hyperlipidemic agents. The invention is further directed to a pharmaceutical composition containing the same, and processes for preparing the same as well as an intermediate therefor.
Nakai Hideo
Nomura Sumihiro
Suzuki Kazuko
Takashima Kohki
Tanaka Takashi
Kirby Eades Gale Baker
Nakai Hideo
Nomura Sumihiro
Suzuki Kazuko
Takashima Kohki
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