C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 9/14 (2006.01) C07F 9/06 (2006.01) C08G 77/08 (2006.01) C08G 77/10 (2006.01) C08G 79/02 (2006.01)
Patent
CA 2124428
The present invention relates to oxygen-containing chlorophosphazenes containing organosilicon radicals, in particular those of the formula Z-PCl2=N(-PCl2=N)n-PCl2O (I) in which 2 is an organosilicon radical bonded to phosphorus via oxygen and n is from 0 to 6, processes for their preparation and their use in processes for the condensation and/or equilibration of organosilicon compounds.
La présente invention porte sur des chlorophosphazènes oxygénés contenant des radicaux organosiliciés, et particulièrement de formule Z-PCl2=N(-PCl2=N)n-PCl2O (I), où 2 est un radical organosilicié lié à un phosphore par un oxygène et n est compris entre 0 et 6, procédés pour leur préparation, et leur utilisation dans des procédés de condensation et (ou) d'équilibre de composés organosiliciés.
Deubzer Bernward
Hager Rudolf
Schneider Otto
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Wacker-Chemie Gmbh
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