Phosphoranyl derivatives containing nitrogen

C - Chemistry – Metallurgy – 07 – F

Patent

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C07F 9/02 (2006.01) A01N 57/18 (2006.01) A01N 57/20 (2006.01) A01N 57/24 (2006.01) A01N 57/36 (2006.01) C07F 9/58 (2006.01) C07F 9/6584 (2006.01) C08F 8/40 (2006.01)

Patent

CA 1133906

ABSTRACT OF THE DISCLOSURE In one aspect the invention relate to the complexed product of the reaction between a haloalkylphonPhonic acid and an amide of the structure O- N(Rl)(R2) where R1,R2 and R3 are as defined below. In another aspect the invention relates to the pbosphoranyl derivatives indicated to have the structure: Image wherein XR is a 2-haloethyl group: Rl, R2 and R3 are each independently hydrogen, phenyl which may be substituted by alkyl of 1 to 4 carbon atoms, alkyl of 1 to 12 carbon atoms optionally substituted with hydroxy, and Rl can additionally be alkenyl of 2 to 6 carbon atoms; or wherein R2 and R3, together with the N and C can form a N-heterocyclic ring having from 3 to 5 carbon atoms in the ring; and the polymer of the above Compound where is vinyl and R2 and R3 with N and C form said N =heterocyclic ring; and the neutralised product of said compound. The invention amount of at least one said complexed compounds to a plant or plant situs. The complexed compounds are ethylen generating agents and promoee matoration for instance.

323636

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