C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 7/18 (2006.01) C11D 3/04 (2006.01) C11D 3/20 (2006.01) C11D 3/39 (2006.01) C11D 3/395 (2006.01) C11D 7/04 (2006.01) C11D 7/26 (2006.01)
Patent
CA 2175738
A phosphorus-free and boron-free cleaning composition containing a phosphorus-free aqueous solution containing an active ingredient (e.g., hydrogen peroxide or a compound capable of releasing hydrogen peroxide under the conditions prevailing in use of the composition), at least one organic stannate which is tetravalent tin complex with dicarboxylic acid, hydroxy carboxylic acid, or tricarboxylic acid, and optionally one organic stabilizer which is a benzoate, a sulfonic acid or salt, or mixtures thereof. The active ingredient is hydrogen peroxide or a percarbonate. The aqueous solution has an alkaline pH.
Aktiengesellschaft Degussa
Evonik Degussa Gmbh
Marks & Clerk
LandOfFree
Phosphorus free stabilized alkaline peroxygen solutions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phosphorus free stabilized alkaline peroxygen solutions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phosphorus free stabilized alkaline peroxygen solutions will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2055855