Phosphorus-nitrogen-oxygen composition and method for making...

B - Operations – Transporting – 05 – D

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356/148, 23/60,

B05D 5/12 (2006.01) C01B 25/12 (2006.01) C23C 16/30 (2006.01) H01L 21/311 (2006.01) H01L 21/314 (2006.01) H01L 29/51 (2006.01)

Patent

CA 1096136

Abstract A composition is described which comprises amorphous phosphorus- nitrogen-oxygen material having excellent thermal stability and low reactivity to a wide variety of chemicals. The material is manu- factured using a chemical vapor deposition process. The reaction chamber is maintained at a temperature between about 400-900°C with a suitable substrate placed therein. Reaction gases containing phosphorus-nitrogen-bearing compounds and a source of oxygen are pas- sed through the chamber to deposit the phosphorus-nitrogen-oxygen film onto the substrate.

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