C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 9/173 (2006.01) C07F 9/165 (2006.01) C07F 9/547 (2006.01) C08F 30/02 (2006.01)
Patent
CA 2044493
Composés representés par les formules (I) et (II) dans lesquelles : R1 = H, CH3 ; X = O, S; R2 = groupes alkylènes linéaires ou ramifiés, cycloalkylènes et hétérocycloalkylènes mono- ou polycycliques, alkylarylènes et arylalkylènes en C1-12; R6 = H, radicaux alkyles et aryles en C1-12; R3 = radicaux alkyles et aryles en C1-20, les groupes -(CH2)pSR4 avec p = entier de 2 à 12 et R4 = alkyle en C1-20, et les groupes Image q entier de 2 à 12 et R5 = H, CH3. (I) Image (II) Image
Cerf Martine
Mieloszynski Jean-Luc
Paquer Daniel
Atochem
Cerf Martine
Mieloszynski Jean-Luc
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
Paquer Daniel
LandOfFree
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