C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
402/392, 260/554
C07C 219/20 (2006.01) C07C 233/38 (2006.01) C08F 2/50 (2006.01)
Patent
CA 1280119
Abstract: The invention provides a photo-curable composition having a high photosensitivity which comprises a photo- polymerizable monomer and, as a photopolymerization initiation system, a mixture of an aromatic ketone and an amine. At least a portion of the monomer and/or the amine is an amine having an acryloyl or methacryloyl group. The composition has good light sensitivity and is resistant to the harmful effects of oxygen.
519433
Kawabata Masami
Kimoto Koichi
Shirota Yasuhiko
Takimoto Yasuyuki
Kawabata Masami
Kimoto Koichi
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
Shirota Yasuhiko
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