G - Physics
03
F
95/94.5
G03F 5/00 (2006.01)
Patent
CA 1322685
ABSTRACT OF THE DISCLOSURE A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
616373
Hirokane Junji
Inui Tetsuya
Mieda Michinobu
Nagahara Yoshiyuki
Ohta Kenji
G. Ronald Bell & Associates
Sharp Kabushiki Kaisha
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