Photo-mask for three-dimensional objects

H - Electricity – 05 – K

Patent

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H05K 3/02 (2006.01)

Patent

CA 2063461

RD-20,636 A PHOTO-MASK FOR THREE-DIMENSIONAL OBJECTS Abstract of the disclosure A photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is positioned along the contoured shape of the membrane. The pattern of tracks on the photo- mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate.

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