C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/393, 400/903
C08F 2/50 (2006.01) A61K 6/08 (2006.01)
Patent
CA 1236645
ABSTRACT OF THE DISCLOSURE A photopolymerisable composition which comprises at least one ethylenically unsaturated polymerisable monomer, at least one ketone selected from fluorenone, benzil, and camphorquinone and their substituted derivatives, at least one reducing agent capable of reducing the ketone when the latter is in an excited state, and at least one organic peroxide. These compositions find use in coatings for a range of substrates, in adhesives, in paints, and in varnishes. They are particularly useful in dental applications, such as glazes, fissure sealants, and orthodontic cements.
537449
Ratcliffe Maurice J.
Robinson Peter A.
Shaw Derek J.
Smart & Biggar
Zeneca Limited
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