Photo-sensitizing compounds in photo-polymerizable systems

Details Photo-sensitizing compounds in photo-polymerizable systems Photo-sensitizing compounds in photo-polymerizable systems

C - Chemistry, Metallurgy

08

F

402/1, 400/5152,

C08F 2/50 (2006.01) C08F 4/32 (2006.01) C08F 299/04 (2006.01) C08J 3/28 (2006.01)

Patent

CA 1083294

Abstract of the Disclosure The present invention concerns novel photo- polymerisable formulations which comprise a photo- polymerisable system in association with photo- sensitizing amount of the compound of formula Image wherein R is an unsubstituted or substituted binuclear aromatic group, e.g. phenoxy phenyl, m is 0, 1 or 2 and Hal is halogen.

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