Photocatalytic semiconductor coating process

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 26/00 (2006.01) C03C 25/42 (2006.01) H01L 21/20 (2006.01)

Patent

CA 2219912

The present invention discloses a simplified method for coating a substrate with photocatalytic semiconductor by mixing photocatalytic semiconductor powder with water to form a mixture, reducing said pH of the mixture to below about 4, sonicating the mixture, coating the substrate therewith, and illuminating the coated substrate with ultra-violet.

L'invention concerne un procédé simplifié de revêtement d'un substrat avec un semiconducteur photocatalytique consistant à mélanger une poudre de semiconducteur photocatalytique avec de l'eau pour former un mélange, à réduire le pH du mélange à un niveau inférieur à environ 4, à soumettre le mélange à une sonification, à revêtir le substrat avec ledit mélange et à exposer aux ultraviolets le substrat revêtu.

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