Photocross-linkable polymers

Details Photocross-linkable polymers Photocross-linkable polymers

C - Chemistry, Metallurgy

08

B

402/2, 260/213,

C08B 15/06 (2006.01) C08F 8/30 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1099439

Abstract of the Disclosure It has been found that certain polymers containing pendant diazo ester groups are photosensitive and have utility in the preparation of both lithographic and relief printing plates, as well as for etching resists for printed circuits. - 1 -

278262

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