C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
C09D 11/02 (2006.01) B41J 2/175 (2006.01) C08F 2/48 (2006.01) C09D 4/00 (2006.01) C09D 11/00 (2006.01) C09D 11/10 (2006.01)
Patent
CA 2357330
An useful aqueous photocurable resin composition is provided. The aqueous photocurable resin composition of the present invention comprises at least water, a polymerizable material polymerizable with radical initiation and a water-soluble photopolymerization initiator which generates a radical with light, wherein the polymerizable material has at least two polymerizable functional groups and one anionic functional group.
Maeda Hiroyuki
Noguchi Hiromichi
Shimomura Masako
Suga Yuko
Canon Kabushiki Kaisha
Ridout & Maybee Llp
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