Photocurable composition, flexible photosensitive articles...

Details Photocurable composition, flexible photosensitive articles... Photocurable composition, flexible photosensitive articles...

G - Physics

03

F

G03F 7/038 (2006.01) G03F 7/033 (2006.01)

Patent

CA 2076511

Abstract of the Disclosure An aqueous developable, photocurable composition and a method of improving solvent resistance and flexibility are disclosed. The composition comprises (a) an acid-containing copolymer having an acid ephr of at least 0.20 and (b) an acid-containing polymer suitable for flexibilizing the composition, which has at least one free ethylenically unsaturated group. It is preferable that either (a) or (b) or both are further reacted with a compound having a free ethylenically unsaturated group and a free acid reactive group, e.g. glycidyl(meth)acrylate. When the composition is formulated with an ethylenically unsaturated monomer and photoinitiator, the photocurable composition is especially suitable for use in an aqueous developable, flexible printing plate.

Affiliated with

Also associated with

Rating

Photocurable composition, flexible photosensitive articles... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photocurable composition, flexible photosensitive articles..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photocurable composition, flexible photosensitive articles... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1593912