C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
C08L 33/08 (2006.01) C08F 2/50 (2006.01) C08F 20/20 (2006.01) C08J 3/24 (2006.01)
Patent
CA 2420783
A photocurable composition is provided which yields an excellent tack-free, hard cured produce without any addition of photoinitiators. A photocurable composition which is excellent in storage stability is also provided. The photocurable composition contains a resin having an acryloyl group and a chemical structure element selected from the group consisting of .beta.-diketone groups and .beta.-ketoester groups, wherein the .beta.-diketane group or the .beta.-ketoester group has a tetra-substituted carbon atom between two carbonyl groups, which is capable of generating one or two free radicals under photoirradiation, and the photocurable composition does not increase more than 25% in viscosity when heated at 60°C for 5 days.
Gaudl Kai-Uwe
Grahe Gerwald F.
Lachowicz Artur
Yatsugi Ken-Ichi
Dainippon Ink And Chemicals Inc.
Kirby Eades Gale Baker
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