C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 7/08 (2006.01) C07C 247/16 (2006.01) C08G 61/00 (2006.01) C08G 61/06 (2006.01) G03F 7/027 (2006.01) G03F 7/038 (2006.01) G03F 7/075 (2006.01)
Patent
CA 2125567
2125567 9312055 PCTABS00022 Photocurable cyclobutarene compositions having a low dielectric constant, low moisture uptake, enhanced oxidative stability, good processability, good planarization, and a long shelf life are disclosed. These polymer compositions are useful in composites, laminates, membranes, films, adhesives, coatings, and electronic applications such as multichip modules and printed circuit boards. An example of such photocurable cyclobutarene compositions is a mixture of a photosensitive agent such as 2,6-bis(4-azidobenzylidene)-4-methylcyclohexanone and a cyclobutarene such as oligomeric divinyltetramethyldi-siloxane bisbenzocyclobutane.
Harris Robert F.
Moyer Eric S.
Oaks Frank L.
Rutter Edward W.
Smart & Biggar
The Dow Chemical Company
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