Photocurable light-sensitive composition and material

H - Electricity – 05 – K

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96/172, 400/5163

H05K 1/00 (2006.01) C08L 33/06 (2006.01) C08L 33/12 (2006.01) C08L 35/06 (2006.01) G03F 7/033 (2006.01) C08L 33/10 (2006.01)

Patent

CA 1127340

ABSTRACT OF THE DISCLOSURE A photocurable composition compr cing a first copolymer having a recurring unit of general formula (I): (I) Image wherein Ar represents a substituted or unsubstituted phenyl group, R1 represents a lower alkyl group, and ml and m2 are positive numbers with ml being greater than or equal to m2; and a second copolymer having a recurring unit of general formula (II): Image (II) wherein R2 represents a lower alkyl group, X represents a hydro- gen atom or a methyl group, and R3 represents an isobutyl group, a t-butyl group or a -CH2Ar group where Ar represents a substi- tuted or unsubstituted phenyl group and when R3 is -CH2Ar, R2 can also be t-butyl and isobutyl, and nl, n2 and n3 are positive numbers but nl can be zero and (n1 + n2)/n3 equals to about 0.5 to 20; and containing suitable amounts of a cross-linking agent and a photoactivator. The photocurable composition when coated on a substrate is useful for the preparation of printing mate- rials, the formation of images, the preparation of printed circuit boards and PS (lithographic printing) plates.

318194

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