C - Chemistry – Metallurgy – 08 – J
Patent
C - Chemistry, Metallurgy
08
J
C08J 5/00 (2006.01) B01D 15/08 (2006.01) B01D 15/18 (2006.01) B01L 3/00 (2006.01) C08G 65/00 (2006.01) C08G 85/00 (2006.01) G01N 31/00 (2006.01) G01N 33/02 (2006.01) G01N 33/18 (2006.01) G01N 33/24 (2006.01) G01N 33/48 (2006.01) G01N 33/53 (2006.01) B67D 7/08 (2010.01)
Patent
CA 2540035
A functionalized photocurable perfluoropolyether is used as a material for fabricating a solvent-resitant microfluidic device. Such solvent~ resistant microfluidic devices can be used to control the flow of small amounts of a fluid, such as an organic solvent, and to perform microscale chemical reactions that are not amenable to other polymer-based microfluidic devices.
L'invention concerne un perfluoropolyéther photopolymérisable fonctionnalisé utilisé comme matériau pour fabriquer un dispositif microfluidique résistant aux solvants. De tels dispositifs microfluidiques résistant aux solvants peuvent être utilisés pour réguler l'écoulement de petites quantités d'un fluide, tel qu'un solvant organique, et pour réaliser des réactions chimiques à petite échelle ne pouvant pas être mises en oeuvre avec d'autres dispositifs microfluidiques à base de matériaux polymères.
Desimone Joseph M.
Quake Stephen R.
Rolland Jason P.
Schorzman Derek A.
Van Dam Michael
California Institute Of Technology
North Carolina State University
Norton Rose Or S.e.n.c.r.l.,s.r.l./llp
University Of North Carolina At Chapel Hill
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