Photodefinable interlevel dielectrics

G - Physics – 03 – F

Patent

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Details

G03F 7/38 (2006.01) G03F 7/038 (2006.01) H01L 21/311 (2006.01) H01L 21/312 (2006.01) H05K 1/03 (2006.01)

Patent

CA 2105657

2105657 9217820 PCTABS00016 A predetermined pattern of a dielectric polymer is formed on a substrate from either a first prepolymer which is the ether of the oligomeric condensation product of dihydric phenol and formaldehyde or a mixture of said oligomer with a second prepolymer which is the ether of the oligomeric condensation product of a dialdehyde and 3 to 4 moles of a phenol.

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