C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 49/84 (2006.01) C07C 43/20 (2006.01) C07C 43/225 (2006.01) C07C 43/23 (2006.01) C07C 45/65 (2006.01) C07C 45/70 (2006.01) C07C 45/71 (2006.01) C07C 45/74 (2006.01) C07C 47/277 (2006.01) C07C 47/575 (2006.01) C07C 49/255 (2006.01) C07C 49/753 (2006.01) C07C 50/32 (2006.01) C07C 59/68 (2006.01) C07C 59/90 (2006.01) C07C 65/28 (2006.01) C07C 65/40 (2006.01) C07C 69/54 (2006.01) C07C 205/35 (2006.01) C07C 205/45 (2006.01) C07C 217/80 (2006.01) C07C 225/22 (2006.01) C07C 255/56 (2006.01) C07C 265/12 (2006.0
Patent
CA 2151151
A polymer has at least one photoactive site and more than one perfluorocyclobutane group. New monomers containing photoactive sites or photoactive precursors and at least one perfluorovinyl group are useful for making such polymers. Processes of making such polymers and the monomers from which they are made are disclosed. The polymers are useful in coatings, in coating, photoresists, and other photoactive applications.
Babb David A.
Clement Katherine S.
Moyer Eric S.
Richey W. Frank
Sorenson Marius W.
Smart & Biggar
The Dow Chemical Company
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