Photodelineable coatings from hydrogen silsesquioxane resin

Details Photodelineable coatings from hydrogen silsesquioxane resin Photodelineable coatings from hydrogen silsesquioxane resin

G - Physics

03

F

G03F 7/075 (2006.01) G03F 7/16 (2006.01) G03F 7/30 (2006.01) G03F 7/40 (2006.01)

Patent

CA 2064971

PHOTODELINEABLE COATINGS FROM HYDROGEN SILSESQUIOXANE RESIN ABSTRACT The present invention relates to a method of forming patterned coatings on substrates, especially electronic devices, by negative resist techniques. The method comprises applying a preceramic coating comprising hydrogen silsesquioxane resin and an initiator onto the substrate and then radiating a selected region of the coating for a time sufficient to cure the resin. The uncured coating is then rinsed away leaving the patterned coating.

Affiliated with

Also associated with

Rating

Photodelineable coatings from hydrogen silsesquioxane resin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photodelineable coatings from hydrogen silsesquioxane resin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photodelineable coatings from hydrogen silsesquioxane resin will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1943179