Photographic exposure control system with independent...

G - Physics – 03 – B

Patent

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95/53.7

G03B 7/08 (2006.01) G03B 7/16 (2006.01)

Patent

CA 1116454

ABSTRACT OF THE DISCLOSURE An exposure control system of the type embodying scanning type shutter blades includes two separate sets of photocell sweep secondary apertures in the shutter blades together with a single photoresponsive element wherein each set of secondary apertures may be controlled independently of the other set to admit scene light to the photoresponsive element in correspondence with the scene light admitted to the film plane during either an ambient or artificially scene lighted mode of operation.

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