Photographic processing controlled by developer temperature

Details Photographic processing controlled by developer temperature Photographic processing controlled by developer temperature

G - Physics

03

D

95/91

G03D 11/00 (2006.01) G03D 13/00 (2006.01)

Patent

CA 1109315

IMPROVEMENTS IN OR RELATING TO THE PROCESSING OF RADIATION SENSITIVE DEVICES ABSTRACT OF THE DISCLOSURE During the processing of an image-wise exposed radiation sensitive device, such as a radiation sensitive plate for lithographic printing plate production, by contacting the device with developer liquid, a temperature sensitive member is immersed in the developer liquid. The member produces an output signal in dependence on the temperature of the developer liquid. This signal is used to control the degree to which the device is processed in a manner dependent on the temperature of the developer liquid for example by controlling the residence time of the device in the developer liquid, by controlling the degree to which the developer liquid is agitated in contact with the device, or by controlling the degree to which the device is subjected to an overall exposure to radiation prior to or during contact with the developer liquid.

309584

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