Photoimageable compositions

Details Photoimageable compositions Photoimageable compositions

G - Physics

03

F

356/12, 96/173

G03F 7/027 (2006.01) G03C 1/675 (2006.01) H05K 3/28 (2006.01)

Patent

CA 2017860

A photoimageable composition for forming a solder mask has a photopolymerizable acrylate chemical system which renders exposed portions insoluble in alkaline aqueous developers and an epoxy chemical system which hardens the composition after exposure ant development. The acrylate chemical system comprises acrylate monomers, epoxy-acrylate oligomers and a photoinitiator. The epoxy chemical system comprises an epoxy resin and a curative therefore. The composition further comprises a cross-linking agent which is reactive with hydroxyl groups of the acrylate and epoxy chemical systems.

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