C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 2/50 (2006.01)
Patent
CA 2699740
Photopolymerisable systems for coatings or photolithography comprising radically photopolimerisable oligomers and/or monomers having ethylenically unsaturated groups and, as photoinitiator, at least one compoundof formula (I).
L'invention concerne des systèmes photopolymérisables pour revêtements ou photolithographie comprenant des oligomères et/ou des monomères photopolymérisables par voie radicalaire comprenant des groupes à insaturation éthylénique et, en tant que photo-initiateur, au moins un composé de formule (I).
Allonas Xavier
Dietlin Celine
Fouassier Jean Pierre
Li Bassi Giuseppe
Norcini Gabriele
Lamberti Spa
Marks & Clerk
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