Photolabile blocked surfactants and compositions containing...

Details Photolabile blocked surfactants and compositions containing... Photolabile blocked surfactants and compositions containing...

B - Operations, Transporting

01

F

260/1, 117/170,

B01F 17/00 (2006.01) C09D 5/00 (2006.01) C09D 7/02 (2006.01) C09J 7/02 (2006.01) G03C 1/72 (2006.01)

Patent

CA 1181392

Abstract of the Disclosure Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked sur- factants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photo- labile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.

382557

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