C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
31/116, 21/3, 20
C02F 1/30 (2006.01) A01N 59/00 (2006.01) A23L 3/26 (2006.01) A23L 3/3463 (2006.01) A61L 9/18 (2006.01) B01J 19/12 (2006.01) C02F 1/32 (2006.01) A62D 3/00 (2006.01)
Patent
CA 1139092
Abstract of the disclosure: A compound selected from some classes of coloring substances having good resistance to light and oxidation is found to have a high photosensitive activity when it is supported in an actively dispersed form on a carrier. The sensitizer obtained is useful for heterogeneous system photosensitive oxidation for various purposes, for example, treatment of harmful organisms or impurities contained in the air or water. The sensitizer has also good resistance to light and oxidation and can be used repeatedly for a long time.
345919
Iwami Isamu
Yoshino Akira
Asahi-Dow Limited
Macrae & Co.
LandOfFree
Photooxidation by exposure to visible light does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photooxidation by exposure to visible light, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photooxidation by exposure to visible light will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-589029