Photopatternable dielectric compositions and method for...

Details Photopatternable dielectric compositions and method for... Photopatternable dielectric compositions and method for...

G - Physics

03

F

96/173, 402/218,

G03F 7/00 (2006.01) G03C 1/71 (1985.01) G03F 7/10 (1985.01)

Patent

CA 1263795

PHOTOPATTERNABLE DIELECTRIC COMPOSITIONS AND METHODS FOR MAKING AND USING ABSTRACT OF THE DISCLOSURE A photosensitive polyamide acid composition consisting essentially of chemically combined units of the formula Image where R is a tetravalent organic radical or a tetravalent organosiloxane-containing radical, R1 is a divalent organic radical or a divalent organosiloxane-containing radical, and A is a photoreactive acrylate, cinnamate or 2,3-diphenylcyclopro- penol ester containing radical.

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