Photopatternable sorbent and functionalized films

Details Photopatternable sorbent and functionalized films Photopatternable sorbent and functionalized films

G - Physics

03

C

G03C 1/73 (2006.01) C08F 2/46 (2006.01) C08F 4/80 (2006.01) C09D 183/07 (2006.01) G03F 7/075 (2006.01)

Patent

CA 2427696

A composition containing a polymer, a crosslinker and a photo-activatable catalyst is placed on a substrate. The composition is exposed to a predetermined pattern of light, leaving an unexposed region. The light causes the polymer to become crosslinked by hydrosilylation. A solvent is used to remove the unexposed composition from the substrate, leaving the exposed pattern to become a sorbent polymer film that will absorb a predetermined chemical species when exposed to such chemical species.

Selon l'invention, on applique sur un substrat une composition contenant un polym­re, un agent de r~ticulation, et un catalyseur photo-activable. La composition est expos~e ~ un motif lumineux pr~d~termin~, et on conserve une r~gion non expos~e. La lumi­re provoque une r~ticulation du polym­re par hydrosilylation. Un solvent est utilis~ afin d'enlever la composition non expos~e du substrat, et le motif expos~ se transforme en un film polym­re sorbant pouvant absorber une esp­ce chimique pr~d~termin~e lorsqu'il est expos~ ~ de telles esp­ces chimiques.

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