C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
96/172, 260/468,
C07C 69/00 (2006.01) C08C 19/30 (2006.01) C08F 8/00 (2006.01) G03F 7/032 (2006.01)
Patent
CA 1100148
Abstract of the Disclosure It has been found that excellent quality photopolymer printing plates having resistance to alcohol-based inks can be prepared from photopolymer compositions comprising a chain extended, liquid, terminally olefinically unsaturated polymer; from about 1% to about 50% by weight based on the weight of the polymer of at least one ethylenically unsaturated monomer; from about 0.1% to about 10% by weight based on the weight of the polymer of photoinitiator; and from about 0.01% to about 2% by weight based on the weight of the polymer of a stabilizer.
314993
Hercules Incorporated
Moffat & Co.
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