Photopolymerisable composition, material coated therewith...

G - Physics – 03 – F

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402/2, 96/219, 9

G03F 7/038 (2006.01) G03F 7/029 (2006.01) G03F 7/037 (2006.01)

Patent

CA 1239499

Photopolymerisable composition, material coated therewith and process for the production of relief images Abstract of the Disclosure The invention relates to photopolymerisable compositions comprising (a) a prepolymer containing photopolymerisable olefinic double bonds, (b) a photoinitiator of the formula Image (II), wherein R1, R2 and R3 are as defined in claim 1, and optionally (c) an ester of acrylic or methacrylic acid or an allyl ether or allyl ester of a polyol. Owing to their excellent light sensitivity, these compositions are suitable for the economic production of high temperature resistant protective layers and relief structures having excellent resolution and good contours.

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