G - Physics – 03 – F
Patent
G - Physics
03
F
402/2, 96/219, 9
G03F 7/038 (2006.01) G03F 7/029 (2006.01) G03F 7/037 (2006.01)
Patent
CA 1239499
Photopolymerisable composition, material coated therewith and process for the production of relief images Abstract of the Disclosure The invention relates to photopolymerisable compositions comprising (a) a prepolymer containing photopolymerisable olefinic double bonds, (b) a photoinitiator of the formula Image (II), wherein R1, R2 and R3 are as defined in claim 1, and optionally (c) an ester of acrylic or methacrylic acid or an allyl ether or allyl ester of a polyol. Owing to their excellent light sensitivity, these compositions are suitable for the economic production of high temperature resistant protective layers and relief structures having excellent resolution and good contours.
447118
Buhler Niklaus
Riediker Martin
Ronde Ottmar
Roth Martin
Arch Specialty Chemicals Inc.
Fetherstonhaugh & Co.
LandOfFree
Photopolymerisable composition, material coated therewith... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photopolymerisable composition, material coated therewith..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerisable composition, material coated therewith... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1182048