C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/33, 402/374,
C08F 4/40 (2006.01) C08F 2/50 (2006.01) C08F 120/00 (2006.01) C08F 283/00 (2006.01) C08F 299/04 (2006.01)
Patent
CA 1058796
ABSTRACT OF THE DISCLOSURE A photopolymerisable composition comprising at least one polymerisable ethylenically unsaturated material and a photo-sensitive catalyst comprising (a) at least one photo- sensitiser having the structure Image (I) where R and R1 may be the same or different and each is a hydro- carbyl or a substituted hydrocarbyl group and A is a hydrocarbyl or a substituted hydrocarbyl group or a group of formula Image (II) or Image (III) where X and Y may be the same or different and each is hydrogen, a hydrocarbyl group or a substituted hydrocarbyl group (prefer- ably X is R and Y is R1), and (b) at least one reducing agent capable of reducing the photosensitiser when the photosensitiser is in an excited state. In addition, there is described a process for the preparation of a polymeric material which com- prises irradiating a photopolymerisable composition as described previously with radiation having a wavelength which is capable of being absorbed by the photosensitiser so as to convert the photosensitiser to an excited state. The compositions are stable in the dark over long periods of time. The combination of photosensitiser and reducing agent produces a composition which is polymerisable at a considerably greater rate than are those compositions which do not contain a reducing agent, but only a photosensitiser.
214043
Heap Nicholas
Nemcek Josef
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