C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/150, 96/43
C08F 2/50 (2006.01) C08F 265/00 (2006.01) C08F 271/02 (2006.01) C08F 291/18 (2006.01) G03F 7/031 (2006.01)
Patent
CA 1079561
ABSTRACT OF THE DISCLOSURE A photopolymerisable composition comprising (a) a water-soluble polymer having an amine, phosphine, arsine or stibine reducing component; (b) a monomer compatible with a solvent for (a) and which is capable of polymerizing with (a) to form a water-insoluble product; and (c) a photosensitiser; and wherein the component (a) is capable of reducing photosen- sitiser (c) when (c) is in an excited state to effect addition polymerisation of components (a) and (b). Also described is a process for the preparation of a polymeric material which comprises irradiating the composition with suitable radiation so as to convert the photosensitiser to an excited state. The composition is of use in the preparation of relief plates for photo-resist applications,
249121
Benson Brian C.
Dixon David R.
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