C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
96/46, 204/91.32
C08L 61/00 (2006.01) C08G 59/68 (2006.01) C08G 85/00 (2006.01) G03F 7/029 (2006.01)
Patent
CA 1209741
Photopolymerisable compositions containing diaryliodosyl salts Abstract of the Disclosure Photopolymerisable compositions contain a cationically poly- merisable material, such as an epoxide resin, a phenoplast, or an aminoplast, and, as photoinitiator, a diaryliodosyl salt of formula Image Zx- V where R9 and R10 are the same or different and each represents a monovalent aromatic radical, x represents 1, 2, or 3, and Zx- is an anion of a protic acid. Suitable diaryliodosyl salts of formula V include diphenyliodosyl hexafluorophosphate, hexafluoroantimonate, tetrafluoroborate, toluene-p-sulphonate, and chloride. The compositions may be used as surface coatings ant adhesives, and in the preparation of of reinforced composites and printed circuits.
436837
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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