Photopolymerisable diepoxides

C - Chemistry – Metallurgy – 07 – D

Patent

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C07D 407/14 (2006.01) C07D 239/00 (2006.01) C07D 303/36 (2006.01) C08G 59/26 (2006.01)

Patent

CA 1078839

Abstract of the Disclosure Diepoxides which may be photopolymerised in the presence or absence of a photosensitiser contain a group having conjugated unsaturation attached to a nitrogen heterocycle, such as a hydantoin or barbituric acid residue, forming part of an advanced diepoxide. The resultant photopolymer may be crosslinked by heating in the presence of a curing agent for epoxide resins. The diepoxides are of use in the production of printing plates and printed circuits, especially multilayer printed circuits.

282940

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