G - Physics – 03 – F
Patent
G - Physics
03
F
96/172, 96/178
G03F 7/031 (2006.01) C08F 2/50 (2006.01)
Patent
CA 1142383
Abstract A photosensitive material is described which comprises a base and a solid photosensitive layer comprising a pho- topolymerisable compound and a photopolymerisation initia- ting mixture consisting of an oxime ester, a photopoly- merisation initiator and a p-dialkylaminobenzene of the formula Image wherein R1 and R2 are lower alkyl, R3 is hydrogen, alkyl, alkoxy or N(R1)(R) and X is -CO-, -CS-, CH2, or -CH(OH)- Synergistic photocuring sensitivity is obtained by said oxime ester in admixture with said p-dialkyl aminobenzene compound.
331460
de Winter Walter F.
Kokelenberg Hendrik E.
Laridon Urbain L.
Marien August M.
Agfa-Gevaert Naamloze Vennootschap
Borden Ladner Gervais Llp
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