Photopolymerisation by means of organometallic salts

Details Photopolymerisation by means of organometallic salts Photopolymerisation by means of organometallic salts

C - Chemistry, Metallurgy

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C08G 59/68 (2006.01) B01J 31/12 (2006.01) B01J 31/20 (2006.01) B29C 35/08 (2006.01) C08F 4/42 (2006.01) C08G 65/10 (2006.01) G03F 7/029 (2006.01)

Patent

CA 1300307

Case 3-13925/ARZ 324/+ PHOTOPOLYMERISATION BY MEANS OF ORGANOMETALLIC SALTS ABSTRACT 1,2-Epoxides are polymerised or cured by exposure to actinic radiation in the presence of a salt of formula Image where Y represents an arene or dienylium group, Q represents an atom of certain d-block transition elements such as manganese and iron, a is a positive integer, M represents an atom of a metal or metalloid, n is 4, 5, or 6, X represents F or Cl, except that MXn- can also represent Sb(OH)F5. Typical such salts are ?-toluenetricarbonylmanganese hexafluorophosphate and tricarbonyl(l-methylcyclohexa-2,4- dienylium)iron hexafluorophosphate.

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