C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/1, 400/1300,
C08F 2/50 (2006.01) G03F 7/031 (2006.01)
Patent
CA 1270089
Abstract: The invention relates to a photopolymerizable composition which is very sensitive to visible light. The composition comprises a polymerizable compound and a photopolymerization initiator. The photopolymerization initiator comprises (a) a xanthene or thioxanthene dye- stuff having a particular formula, (b) a photosensitizer selected from the group consisting of N-phenylglycine, 2,4,6-tris(trichloromethyl)-1,3,5-triazine, and a mixture of p-dimethylaminobenzoic acid isopentyl ester and 2,4-diisopropylthioxanthone, and (c) a peroxide.
514865
Kawabata Masami
Kimoto Koichi
Takimoto Yasuyuki
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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