G - Physics – 03 – F
Patent
G - Physics
03
F
96/150
G03F 7/031 (2006.01)
Patent
CA 1333853
The present invention is directed to a photopolymerizable composition which is very sensitive to light, especially visible light having a wave length of 600 to 700 nm. The photopolymerizable composition comprises a polymerizable compound having an ethylenically unsaturated double bond and a photopolymerization initiator wherein the photopolymerization initiator comprises (a) a specific sensitizer and (b) a radical forming agent. The photopolymerizable composition can be used in scanning exposure apparatus.
582516
Harada Masahiko
Kawabata Masami
Takimoto Yasuyuki
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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