Photopolymerizable composition and photosensitive...

Details Photopolymerizable composition and photosensitive... Photopolymerizable composition and photosensitive...

G - Physics

03

F

G03F 7/032 (2006.01) G03F 7/031 (2006.01)

Patent

CA 2073494

- 29 - ABSTRACT OF THE DISCLOSURE A photopolymerizable composition comprising (A) an addition-polymerizable compound having an ethylenically unsaturated double bond (B) a compound of the formula: Image [I] [wherein R1 is substituted or nonsubstituted phenyl group, R2 and R3 are the same or different and indicate a hydrogen atom or a C1-4 alkyl group, R4 is an alkylene group which may have at least one sort of a substituent selected from alkyl, hydroxyl and oxo (=O) on a main chain, or which may contain at least one sort selected from an oxygen atom and a cycloalkylene group in a main chain, R5 is a hydrogen atom or a methyl group, and a and b are independently 0 or 1], (C) a light absorbing compound, and (D) a film-forming polymer having alkaline solubility or alkaline swelling characteristic is disclosed. There is also disclosed a photosensitive lithographic printing plate comprising the photopolymerizable composition.

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