Photopolymerizable composition and photosensitive...

G - Physics – 03 – F

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G03F 7/028 (2006.01) G03F 7/038 (2006.01) G03F 7/075 (2006.01) G03F 7/09 (2006.01)

Patent

CA 2053984

- 25 - ABSTRACT OF THE DISCLOSURE A photopolymerizable composition comprising (I) a polymerizable compound having an ethylenically unsaturated double bond, (II) a film-forming having alkali-solubility or alkali-swell characteristic and (III) a photopolymerization initiator is disclosed. The photopolymerizable composition further comprising (IV) a silane coupling agent having at least one group selected from the group consisting of vinyl group, acryloyl group and methacryloyl group at a terminal end of the molecule. There is also disclosed a photosensitive lithographic printing plate comprising the photopolymerizable composition as a photosensitive layer and an aluminum plate as a substrate.

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