Photopolymerizable composition comprising a squarylium compound

C - Chemistry – Metallurgy – 07 – D

Patent

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Details

C07D 215/14 (2006.01) C08F 2/50 (2006.01) C09B 23/04 (2006.01) G03F 7/027 (2006.01) G03F 7/029 (2006.01) G03F 7/031 (2006.01) C08F 222/10 (2006.01)

Patent

CA 2118604

The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): Image The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, PS plates for laser direct process, dry film resists, digital proofs. photosensitive microcapsules.

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