C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 215/14 (2006.01) C08F 2/50 (2006.01) C09B 23/04 (2006.01) G03F 7/027 (2006.01) G03F 7/029 (2006.01) G03F 7/031 (2006.01) C08F 222/10 (2006.01)
Patent
CA 2118604
The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): Image The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, PS plates for laser direct process, dry film resists, digital proofs. photosensitive microcapsules.
Ito Yukiyoshi
Kawato Hitoshi
Koseki Kenichi
Obara Mitsuharu
Shimizu Ikuo
Goudreau Gage Dubuc
Kyowa Hakko Kogyo Co. Ltd.
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