Photopolymerizable composition containing n-vinyl...

C - Chemistry – Metallurgy – 08 – F

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C08F 2/50 (2006.01) C08F 291/18 (2006.01) G03F 7/033 (2006.01)

Patent

CA 1064755

ABSTRACT OF THE DISCLOSURE A photopolymerisable composition comprising:- (a) 50%-95% by weight of a mixture of poly (N-vinyl pyrrolidone) and polyvinyl acetate, or a copolymer of N- vinyl pyrrolidone and vinyl acetate; (b) 5%-50% by weight of an addition-polymerisable monomer comprising at least two non-conjugated ethylenic double bonds and which is soluble in or compatible with a solvent or dispersing medium for (a); and (c) a photoinitiator capable of initiating polymerisation of the monomer whereby the composition may be rendered water-insoluble by radiation. The compositions are of use in water developable photosensitive plates and in the preparation of relief plates.

210077

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