C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/153
C08F 2/50 (2006.01) C08F 291/18 (2006.01) G03F 7/033 (2006.01)
Patent
CA 1064755
ABSTRACT OF THE DISCLOSURE A photopolymerisable composition comprising:- (a) 50%-95% by weight of a mixture of poly (N-vinyl pyrrolidone) and polyvinyl acetate, or a copolymer of N- vinyl pyrrolidone and vinyl acetate; (b) 5%-50% by weight of an addition-polymerisable monomer comprising at least two non-conjugated ethylenic double bonds and which is soluble in or compatible with a solvent or dispersing medium for (a); and (c) a photoinitiator capable of initiating polymerisation of the monomer whereby the composition may be rendered water-insoluble by radiation. The compositions are of use in water developable photosensitive plates and in the preparation of relief plates.
210077
Allen John G.
Cohen David L.
Coupe Derek
Imperial Chemical Industries Limited
Na
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